《Microelectronics Process》MEMS Mask layout

MEMS Mask layout a Die leve a Dark-field mask a Dimensions are in micron Beam length 100 200 500 20 200 20 写已 P口口□□ 日z22 100 50100200500 1000 Beam Length

MEMS Mask Layout ‰ Die Level ‰ Dark-field mask ‰ Dimensions are in micron 20 50 100 200 500 Beam Length Beam Width 5 10 20 50 100 200 B e a m Width 5 10 20 50 100 50 100 200 500 1000 Beam Length